NEW: BEST STUDENT PAPER AWARD
For the first time, the EMLC 2009 will reward the best Student Paper, based on a generous
sponsorship by Carl Zeiss. If applicable, please identify your paper as student paper.
The program committee requests contributions on the topics listed below.
Mask Manufacturing
Pattern Generation and Data Preparation
Photomask- Processes and Materials
Mask Process Yield
Photomasks with RET and OPC; PSM
Mask for NGL: E-Beam, EUV; NIL etc.
Metrology Tools and Technologies
Defect Inspection- and Repair Tools
Cleaning and Pelliclization
Mask Business
Mask Business and Management
Direct Write / Maskless Technologies
Other Mask Topics
Mask Cost and Mask Development Strategy
Future Mask Demand
Lithography and Mask Applications
RET, OPC, Double Exposure, MEEF
Resist
Mask Defect Printability
Optical Materials
Immersion Lithography
Immersion Defectivity
Alternate Immersion Fluids
Emerging Mask and Lithography Technologies
EUV Mask Material & Processes
EUV Mask Infastructure
NIL
Double Exposure
Mask and Lithography Equipment